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An in-depth analysis of PMOS (P-channel Metal-Oxide-Semiconductor) transistors, including their basic structure, critical dimensions, operation principles, and equations. PMOS is a p-channel device with n- and p-type regions reversed compared to NMOS. topics such as the PMOS capacitor, hole inversion, threshold voltage, and the i-v curve.
Typology: Exams
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n -type substrate
p -type source
& drain
gate oxide
metal contacts
p -channel device ( n - and p -type regions reversed.)
oxide
width (
W )
oxide
gate
gate length (distance from source
to drain) – currently
as small as 20 nm.
width: typical L to 10 L
( W/L ratio is important)
oxide thickness: typical 1 - 10 nm.
width (
W )
oxide
gate
length (
L
)
oxide thickness ( t ox
)
source
drain
width (
W )
Same as the NMOS capacitor, but with n -type substrate.
In the substrate, there are lots of electrons (majority carriers), and
relatively few holes (minority carriers).
ox
body gate
contact
substrate (body)
Apply a positive voltage
to the gate – electron
accumulation.
Apply a (smallish)
negative voltage to the
gate. Electrons are pushed
away and a few holes are
attracted – carrier
depletion.
v GB
body gate
contact
substrate (body)
v GB
body gate
contact
substrate (body)
v
GB
electron accumulation
T
< v
GB
carrier depletion
v
GB
T
inversion –
hole sheet forms.
(Note: V T is negative.)
Through the application of the gate voltage, we can control what is
happening with carriers under the gate.
Creating a hole inversion layer connects the source to the drain. The
PMOS is “on”.
For now, we connect the source to the body and apply the controlling
voltage between the gate and the source. This is OK for the time
being, but we will have to revisit the issue of the body connection
later. With the drain also at ground, the inversion layer (channel) is
uniform between source and drain.
i D
electrons drain
source
gate
n
p p
v GS
T
hole inversion layer
body
If v DS is kept small, the current flow is
“ohmic” – like a resistor. R DS depends on
the how much gate voltage is applied
(determining the hole concentration in
the inversion layer) and the physical
dimensions of the PMOS.
i D
v DS
DS
v DS
i D
holes
drain
source
gate
n
p p
v GS
T
hole inversion layer
body
v DS
i D
holes
drain
source
gate
n
p p
v GS
T
hole inversion layer
body
But as v DS becomes more negative, the
hole concentration at the drain is reduced
is becoming more resistive. The i-v curve
becomes non-linear, becoming parabolic.
i D
2 ( v GS